High purity Sputtering Metal target Tungsten W target special-shaped customization manufacturer from China

    Tungsten target material. The chemical element symbol of tungsten is W, the atomic number is 74, the relative atomic mass is 183.85, the atomic radius is 137 picometers, and the density is 19.35 grams per cubic centimeter. It belongs to the sixth period of the periodic table (the second Long-term) VIB family. Tungsten is mainly a hexavalent cation in nature, and its ion radius is 0.68×10-10m. Because W6+ has a small ion radius, high electricity price, strong polarization ability, and easy to form complex anions, tungsten is mainly in the form of complex anions [WO4]2-, which combines with Fe2+, Mn2+, Ca2+ and other cations in the solution to form wolframite or white Tungsten ore precipitates. After smelting, tungsten is a silver-white shiny metal with extremely high melting point, high hardness, low vapor pressure, low evaporation rate, and relatively stable chemical properties. 

    Tungsten can be used to make firearms, nozzles of rocket thrusters, metal cutting blades, drill bits, super-hard dies, wire drawing dies, etc. It has a wide range of uses. The most important alloys in the alloy series are alloy steel and various forged parts of pure tungsten. In the production of electronic tubes, radio electronics and X-ray technology, compounds are mainly used to produce certain types of paints and pigments, inks, electroplating, etc., and are also used as catalysts. The following figure shows two typical microscopic metallographic inspection pictures of tungsten sputtering targets, with an average particle size <50um.

     As long as you provide detailed target information, such as purity, size, tolerance requirements, and other technical requirements, we will provide you with a quotation as soon as possible and provide the fastest delivery time.

   We Produce High-Purity Sputtering Targets. Its Most Important Advantage Is That In The Process Of Physical Vapor Deposition, A Thin Film With Excellent Conductivity And Particle Minimization Can Be Obtained. The Following Table Is The Certificate Of Composition Analysis Of 3N5 High-Purity Tungsten Sputtering Target. The Analytical Methods Used: 1. Use ICP-OES To Analyze Metal Elements; 2. Use LECO To Analyze Gas Elements.