Item NO.:
GS-T004Payment:
L/C、 Western Union、 D/P、 T/TProduct Origin:
Anhui, ChinaMax Size:
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Package:
100 clean bag,1000 exactly clean bagProduct Detail
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As long as you provide detailed target information, such as purity, size, tolerance requirements, and other technical requirements, we will provide you with a quotation as soon as possible and provide the fastest delivery time.
We Produce High-Purity Sputtering Targets. Its Most Important Advantage Is That In The Process Of Physical Vapor Deposition, A Thin Film With Excellent Conductivity And Particle Minimization Can Be Obtained. The Following Table Is A Certificate Of Composition Analysis Of 4N High Purity Iron Sputtering Target. The Analytical Methods Used: 1. Use ICP-OES To Analyze Metal Elements; 2. Use LECO To Analyze Gas Elements.